NAED Unveils PV-1 PECVD-V, a U.S.-Engineered Vertical Deposition Platform Built for 96,000-Wafer-per-Hour Tandem Solar Manufacturing

MIAMI, Nov. 11, 2026 (GLOBE NEWSWIRE) -- NAED Energy Holding Inc. ("NAED"), the U.S. aerospace, engineering and utility-energy company behind NAED Nexus Coreâ„¢, today unveiled PV-1 PECVD-V, a vertical in-line deposition platform for high-volume solar cell manufacturing. PV-1 combines plasma-enhanced chemical vapor deposition (PECVD) and physical vapor deposition (PVD) on a single shared-carrier line. It is designed for a throughput of 96,000 wafers per hour, double the 48,000 wafers per hour of NAED's previous XL-class platform.

In PV-1, wafers travel upright on a shared carrier through every PECVD and PVD stage. To reach the second side of the wafer, the system never flips the substrate: the entire carrier is lifted and turned 180 degrees as a unit. This keeps wafers seated in the same carrier from first deposition to last, cutting direct wafer handling between process steps. The PV-1 production line, its 180-degree carrier turn, its wafer-retention carrier and the T2X tandem cell are the subject of pending U.S. patent applications assigned to NAED Energy Holding Inc. NAED's intellectual property portfolio has been independently appraised at $179 million under an ASC 820 Level 3 fair-value methodology, as of November 11, 2026.

Globenewswire